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Temperature control module improves nanolithography performance
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NanoInk
: 28 May, 2009 (New Product) |
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NanoInk unveils a new thermoelectric variable temperature control module for the company’s patented Dip Pen Nanolithography (DPN). |
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Vice President of NanoInk’s NanoFabrication System Division, Tom Levesque said “We have seen that the versatility of the materials which can be controllably deposited with DPN will grow with this new range of temperatures. Previous work centred around materials deposited close to ambient conditions, but this new approach enables the deposition of a wide variety of new molecules that were deemed challenging and impossible to deposit under ambient conditions. This gives us more flexibility and expands our choice of chemistries. This new stage extends the range from as low as four to as high as 80 degrees C.”
Recent work presented at the NSTI meeting in Houston, Texas, USA, showed how extended temperatures enabled the creation of modified substrates for stem cell culture. Dr Nabil Amro, Senior Scientist at NanoInk, explained: “Our ability to fabricate features of alkanethiols under 100nm in size and extending over areas of square centimetres could not have been achieved without extended temperature control. These substrates are proving truly remarkable at controlling and selecting specific stem cell paths of differentiation.”
The extended temperature DPN module will be available for NanoInk’s DPN 5000 and NSCRIPTOR systems in July 2009. |
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